Aluminium Nitride as a Promising Multifunctional Material. Pt. 1. Properties, Crystal Structure, and Production Techniques

RUDENKO Е.M.$^{1}$, KOROTASH I.V.$^{1}$, DYAKIN M.V.$^{1}$, POLOTSKIY D.Yu.$^{1}$, BESPALOV S.A.$^{1}$, O.V. HAMALII$^{2}$, HAMALII N.V.$^{3}$, and DEKHTYARENKO V.A.$^{1,4}$

$^1$G.V. Kurdyumov Institute for Metal Physics of the N.A.S. of Ukraine, 36 Academician Vernadsky Blvd., UA-03142 Kyiv, Ukraine
$^2$State Scientific-Research Institute of Aviation, 6 Kazarmenna Ave., UA-01135 Kyiv, Ukraine
$^3$Central Scientific Research Institute of Armament and Military Equipment of Armed Forces of Ukraine, 28 Povitrianykh Syl Ave., UA-03049 Kyiv, Ukraine
$^4$E.O. Paton Electric Welding Institute of the N.A.S. of Ukraine, 11 Kazymyr Malevych Str., UA-03150 Kyiv, Ukraine

Received / final version: 01.03.2025 / 01.06.2026 Download PDF logo PDF

Abstract
A promising material among the nitrides of Group III, namely, aluminium nitride (AlN), is considered. This material is widely used in industry due to its unique properties. Main physical and mechanical properties of AlN, as well as the fields of its application (in acoustic, electronic, and optical devices), are discussed. According to thermodynamic calculations, the Gibbs free energy of the oxidation of metallic aluminium with Al2O3 formation is comparatively low, so, it interacts more actively with oxygen than with nitrogen. According to the van ’t Hoff equation, the reaction of aluminium with nitrogen is activated, when the partial pressure of nitrogen exceeds significantly the pressure of oxygen; only in this case, aluminium reacts predominantly with nitrogen and the AlN chemical compound is formed. The ways to reduce the negative impact of oxygen on the process of aluminium-nitride formation are discussed. The main techniques for manufacturing aluminium nitride, in particular, thin films, are considered; their main advantages and disadvantages are surveyed. As shown, based on the main mechanism of chemical reaction between the initial components, the manufacturing techniques are divided into six complex groups. Depending on the conditions of formation, aluminium nitride can have four modifications: (i) a wurtzite structure with a band gap width of 6.2 eV; (ii) a layered hexagonal structure with a band gap width of 3.44 eV; (iii) a zinc-blende structure with a band gap width of 3.24 eV; (iv) a rock-salt structure with a band gap width of 4.04 eV. The features of these types of AlN structure are analysed.

Keywords: aluminium nitride, manufacturing techniques, crystal structure, thin-film coating, physical and mechanical properties.

DOI: https://doi.org/10.15407/ufm.27.02.***

Citation: Е.M. Rudenko, I.V. Korotash, M.V. Dyakin, D.Yu. Polotskiy, S.A. Bespalov, O.V. Hamalii, N.V. Hamalii, and V.A. Dekhtyarenko, Aluminium Nitride as a Promising Multifunctional Material. Pt. 1. Properties, Crystal Structure, and Production Techniques, Progress in Physics of Metals, 27, No. 2: ***–*** (2026)


References  
  1. J.C. Paz de Mattos, L.F. Rodrigues, É. Marlon de Moraes Flores, and V. Krivan, Determination of Trace Impurities in Aluminum Nitride by Direct Solid Sampling Graphite Furnace Atomic Absorption Spectrometry, Spectrochim. Acta, Part B: At. Spectrosc., 66, No. 8: 637–643 (2011); https://doi.org/10.1016/j.sab.2011.07.002
  2. F. Briegleb and A. Geuther, Ueber das Stickstoffmagnesium und die Affinitäten des Stickgases zu Metallen, Justus Liebigs Annalen der Chemie., 123, No. 2: 228-241 (1862); https://doi.org/10.1002/jlac.18621230212
  3. L. Guo, H.S. Wu, and Z.H. Jin, Magic Behavior and Bonding Nature in Hydrogenated Aluminum Nitride Clusters, Appl. Surf. Sci., 242: 88–96 (2005); https://doi.org/10.1016/j.apsusc.2004.08.001
  4. L. Shen, T. Cheng, L. Wu, X. Li, and Q. Cui, Synthesis and Optical Properties of Aluminum Nitride Nanowires Prepared by arc Discharge Method, J. Alloys Compds., 465: 562–566 (2008); https://doi.org/10.1016/j.jallcom.2007.11.007
  5. B. Sundarapandian, L. Kirste, P. Straňák, M. Prescher, S. Münch, and M. Raghuwanshi, Optical Properties of Aluminum Nitride Thin Films Prepared by Magnetron Sputter Epitaxy, Phys. Status Solidi A, 222: 202500243 (2025); https://doi.org/10.1002/pssa.202500243
  6. Е.M. Rudenko, M.V. Dyakin, I.V. Korotash, D.Yu. Polotskiy, and V.A. Dekhtyarenko, Helicon-Arc Ion-Plasma Synthesis of AlN-Based Film Coatings on the Steel 3 and Aluminium Substrates, Metallofiz. Noveishie Tekhnol., 47, No. 7: 703–715 (2025); https://doi.org/10.15407/mfint.47.07.0703
  7. Z.-Y. Jiao, S.-H. Ma, and J.-F. Yang, A Comparison of the Electronic and Optical Properties of Zinc-blende, Rocksalt and Wurtzite AlN: A DFT Study, Solid State Sci., 13, No. 2: 331–336 (2011); https://doi.org/10.1016/j.solidstatesciences.2010.11.030
  8. R.Т. Bondokov, K. Hogan, G.Q. Norbury, S. Matsumoto, and J. Grandusky, Development of 100 mm AlN Single‐Crystal Growth and Subsequent Substrate Preparation Phys. Status Solidi B, 262: 2500032 (2025); https://doi.org/10.1002/pssb.202500032
  9. H. Yang, J. Sun, H. Wang, H. Li, and B. Yang, A Review of Oriented Wurtzite-Structure Aluminum Nitride Films, J. Alloys Compds., 989: 174330 (2024); https://doi.org/10.1016/j.jallcom.2024.174330
  10. V.Ya. Shevchenko and S.M. Barinov, Technical Ceramics (Moskva: Nauka: 1993).
  11. S.T. Haider, M.A. Shah, D.-G. Lee, and S. Hur, A Review of the Recent Applications of Aluminum Nitride-Based Piezoelectric Devices, IEEE Access, 11: 58779–58795 (2023); https://doi.org/10.1109/ACCESS.2023.3276716
  12. O.Ye. Pogorelov, O.V. Filatov, E.M. Rudenko, I.V. Korotash, and M.V. Dyakin, Characterization Methods of Heat Flows in Solids, Prog. Phys. Met., 24, No. 2: 239–281 (2023); https://doi.org/10.15407/ufm.24.02.239
  13. E.M. Rudenko, A.O. Krakovnyy, M.V. Dyakin, I.V. Korotash, D.Yu. Polotskiy, and M.A. Skoryk, Cross Thermal Conductivity of Aluminium Nitride Films and Thermal Resistance of AlN/Si and AlN/Al Interfaces, Metallofiz. Noveishie Tekhnol., 44, No. 8: 989–1002 (2022); https://doi.org/10.15407/mfint.44.08.0989
  14. A. Jacquot, B. Lenoir, A. Dauscher, P. Verardi, F. Craciun, M. Stölzer, M. Gartner, and M. Dinescu, Optical and Thermal Characterization of AlN Thin Films Deposited by Pulsed Laser Deposition, Appl. Surf. Sci., 186: 507 (2002); https://doi.org/10.1016/S0169-4332(01)00767-X
  15. R.L. Xu, M.M. Rojo, S.M. Islam, A. Sood, B. Vareskic, A. Katre, N. Mingo, K.E. Goodson, H.G. Xing, D. Jena, and E. Pop, Thermal Conductivity of Crystalline AlN and the Influence of Atomic-Scale Defects, J. Appl. Phys., 126: 185105 (2019); https://doi.org/10.1063/1.5097172
  16. E. Rudenko, V. Burlakov, I. Korotash, M. Dyakin, D. Polotskiy, and O. Kalenyuk, Effective Thermal Conductivity of Flexible Two-Layer Aluminum Nitride/Polytetrafluoroethylene Structure, Phys. Status Solidi A, 222, No. 10: 2400860 (2025); https://doi.org/10.1002/pssa.202400860
  17. E. Rudenko, Z. Tsybrii, F. Sizov, I. Korotash, D. Polotskiy, M. Skoryk, M. Vuichyk, and K. Svezhentsova, Infrared Blocking, Microwave and Terahertz Low-Loss Transmission AlN Films Grown on Flexible Polymeric Substrates, J. Appl. Phys., 121, Nо. 13: 135304 (2017); https://doi.org/10.1063/1.4979858
  18. Z. Tsybrii, F. Sizov, M. Vuichyk, I. Korotash, and E. Rudenko, AlN and MgO Thin-Layer Coatings on the Bendable Polymeric Substrates as Selective Filters for IR and THz Spectral Ranges, Infr. Phys. Technol., 107: 103323 (2020); https://doi.org/10.1016/j.infrared.2020.103323
  19. F. Sizov, Z. Tsybrii, E. Rudenko, I. Korotash, M Vuichyk, K Svezhentsova, and D. Polotskiy, Reststrahlen Band Infrared Damping, Microwave Transparent AlN/Polymeric Film Filters, Vacuum, 225: 113248 (2024); https://doi.org/10.1016/j.vacuum.2024.113248
  20. D. Oryshych, V. Dekhtyarenko, T. Pryadko, V. Bondarchuk, and D. Polotskiy, Рrotection of Titanium Against Hydrogen Embrittlement, Machines Technologies Materials, 13, No. 12: 561 (2019).
  21. T.V. Pryadko, V.A. Dekhtyarenko, V.I. Bondarchuk, M.A. Vasilyev, and S.M. Voloshko, Complex Approach to Protecting Titanium Constructions from Hydrogen Embrittlement, Metallofiz. Noveishie Tekhnol., 42, No. 10: 1419–1429 (2020); https://doi.org/10.15407/mfint.42.10.1419
  22. T.V. Pryadko, V.A. Dekhtyarenko, and A.A. Shkola, Influence of the Ambient Medium in the Course of Laser Treatment on the Resistance of Titanium to Hydrogen Embrittlement, Mater. Sci., 56: 75–81 (2020); https://doi.org/10.1007/s11003-020-00399-w
  23. V.A. Dekhtyarenko, T.V. Pryadko, О.І. Boshko, V.V. Kirilchuk, H.Yu. Mykhailova, and V.I. Bondarchuk, Hydrogen Embrittlement of Titanium: Phenomena and Main Ways of Prevention, Prog. Phys. Met., 25, No. 2: 276–293 (2024); https://doi.org/10.15407/ufm.25.02.276
  24. V.A. Dekhtyarenko, T.V. Pryadko, V.V. Kyrylchuk, M.S. Nizameyev, and V.I. Bondarchuk, Cobalt-Based Alloy Coating for Protecting Titanium from Hydrogen Permeation, Metallofiz. Noveishie Tekhnol., 47, No. 11: 1185–1198 (2025); https://doi.org/10.15407/mfint.47.11.1185
  25. J. Liu, S. Zhang, B. Lou, and H. Shen, Formation of Aluminum Nitride in Dross by Contact-Diffusion Reaction During Aluminum Recycling, J. Alloys Compds., 1010: 177432 (2025); https://doi.org/10.1016/j.jallcom.2024.177432
  26. C.C. Chen, C.Y. Chen, H.W. Yang, Y.K. Kuo, and J.S. Lin, Phase Equilibrium in Carbothermal Reduction Al2O3→AlN Studied by Thermodynamic Calculations, Atlas J. Mater. Sci., 1, No. 2: 30–37 (2014); https://doi.org/10.5147/ajms.2014.0172
  27. R.G. Reddy, Thermodynamics and Synthesis of AlN-Reinforced Mg Alloy Composites, Metall. Mater. Trans B, 55: 2115–2123 (2024); https://doi.org/10.1007/s11663-024-03100-7
  28. D. Kent, J. Drennan, and G. Schaffer, A Morphological Study of Nitride Formed on Al at Low Temperature in the Presence of Mg, Acta Mater., 59: 2469–2480 (2011); https://doi.org/10.1016/j.actamat.2010.12.050
  29. S. Huo, M. Qian, G. Schaffer, and E. Crossin, Aluminium Powder Metallurgy, Fundamentals of Aluminium Metallurgy (Elsevier: 2011), p. 655–701; https://doi.org/10.1533/9780857090256.3.655
  30. Q. Zheng and R.G. Reddy, Kinetics of In-situ Formation of AlN in Al Alloy Melts by Bubbling Ammonia Gas, Metall. Mater. Trans. B, 34: 793–804 (2003); https://doi.org/10.1007/s11663-003-0085-y
  31. W.-S. Jung, Synthesis of Aluminum Nitride Powder from δ-Alumina Nanopowders under a Mixed Gas Flow of Nitrogen and Hydrogen, Ceramics Int., 38: 871–874 (2012); https://doi.org/10.1016/j.ceramint.2011.07.002
  32. A.A. Elagin, A.R. Beketov, M.V. Baranov, and R.A. Shishkin, Aluminum Nitride. Preparation Methods (Review), Refract. Ind. Ceram., 53, No. 6: 57–67 (2013); https://doi.org/10.1007/s11148-013-9546-2
  33. M.E. Galvez, A. Frei, F. Meier, and A. Steinfeld, Production of AlN by Carbothermal and Methanothermal Reduction of Al2O3 in N2 Flow Using Concentrated Thermal Radiation, Ind. Eng. Chem. Res., 48: 528–533 (2009); https://doi.org/10.1021/ie8011193
  34. O. Takeda, K. Takagi, T. Handa, K. Katagiri, H. Zhu, and Y. Sato, Production of Aluminum Nitride from Aluminum Metal Using Molten Fluoride, J. Mater. Res., 30, No. 5: 635–644 (2015); https://doi.org/10.1557/jmr.2015.22
  35. Y. Qiu and L. Gao, Nitridation Reaction of Aluminum Powder in Flowing Ammonia, J. Europ. Ceram. Soc., 23: 2015–2022 (2003); https://doi.org/10.1016/S0955-2219(03)00014-1
  36. S. Liao, Rafi ud-din, L. Zhang, A. Chu, Y. Zhao, T. Li, and S. Liang, Optimization of Process Parameters for Preparing AlN Nanopowders by Combining Carbon-Containing Droplet Combustion and Carbothermal Reduction Methods, Ceram. Int., 50, No. 24: 53183–53192 (2024); https://doi.org/10.1016/j.ceramint.2024.10.168
  37. R.A. Janes, M.A. Low, and R.B. Kaner, Rapid Solid-State Metathesis Routes to Aluminum Nitride, Inorg. Chem., 42, No. 8: 2714–2719 (2003); https://doi.org/10.1021/ic026143z
  38. V.S. Kudyakova, R.A. Shishkin, A.A. Elagin, M.V. Baranov, and A.R. Beketov, Aluminium Nitride Cubic Modifications Synthesis Methods and Its Features. Review, J. Eur. Ceram. Soc., 37, No. 4: 1143–1156 (2017); https://doi.org/10.1016/j.jeurceramsoc.2016.11.051
  39. N.R. Fetter, B. Bartocha, F.E. Brinckman Jr., and D.W. Moore, Some Reactions of Organoaluminum Compounds with Nitrogen-Containing Bases, Canadian J. Chem., 41, No. 5: 1359–1367 (1963); https://doi.org/10.1139/v63-186
  40. T. Mori, T. Kobayashi, Y. Kawanishi, H. Kominami, Y. Nakanishi, and K. Hara, Fabrication of AlN Single Crystal Particles by a Chemical Vapor Method Using Aluminum Chloride, Phys. Status Solidi C, 8: 1459–1462 (2011); https://doi.org/10.1002/pssc.201001115
  41. C. Li, C. Xu, Y. Shi, J. Song, P. Du, C. Xie, G. Xue, Z. Chen, L. Wang, and Z. Wang, Effect of Different Phases of Alumina on the Preparation of Aluminum Nitride Powder by Carbothermal Reduction-Nitridation Method, Ceram. Int., 51, No. 19: 28229–28235 (2025); https://doi.org/10.1016/j.ceramint.2025.04.035
  42. K. Ramakrishnaiahand N. Subramanyan, Effect of some Nitrogen Containing Organic Compounds on the Corrosion and Polarization Behaviour of Aluminium in 1M Solutions of Sodium Hydroxide and Hydrochloric Acid with and without Calcium, Corros. Sci., 16, No. 5: 307–316 (1976); https://doi.org/10.1016/0010-938X(76)90116-5
  43. A. Sakthisabarimoorthi, S.M. Lee, S.S. Ryu, and D.H. Yoon, Impact of Various Input Parameters on the Preparation of Different AlN Nanostructures by Hybrid Route of Hydrothermal and Carbothermal Reduction Nitridation Technique, Korean J. Chem. Eng., 41: 147–155 (2024); https://doi.org/10.1007/s11814-024-00028-1
  44. Y. Wang, L. Qiao, J. Zheng, Y. Ying, J. Yu, W. Li, and S. Che, Preparation of AlN with Low Agglomeration Using Polyethylene Glycol and Emulsifier to Disperse the Ultrafine Raw Powders, Ceram. Int., 49, No. 1: 1390–1400 (2023); https://doi.org/10.1016/j.ceramint.2022.09.120
  45. G. Selvaduray and L. Sheet, Aluminium Nitride: Review of Synthesis Methods, Mater. Sci. Technol., 9: 463-473 (2013); https://doi.org/10.1179/mst.1993.9.6.463
  46. T. Kato and K. Sugawara, Low-Temperature Synthesis of Aluminum Nitride by Addition of Ammonium Chloride, ACS Omega, 4, No. 12: 14714–14720 (2019); https://doi.org/10.1021/acsomega.9b01140
  47. S. Rogers, M. Dargusch, and D. Kent, Impacts of Temperature and Time on Direct Nitridation of Aluminium Powders for Preparation of AlN Reinforcement, Materials, 16, No. 4: 1583 (2023); https://doi.org/10.3390/ma16041583
  48. S.A. Rounaghi, H. Eshghi, S. Scudino, A. Vyalikh, D.E.P. Vanpoucke, W. Gruner, S. Oswald, A.R. Kiani Rashid, M.S. Khoshkhoo, U. Scheler, and J. Eckert, Mechanochemical Route to the Synthesis of Nanostructured Aluminium Nitride, Sci. Rep., 6: 33375 (2016); https://doi.org/10.1038/srep33375
  49. G. Li, B. Li, B. Ren, H. Chen, B. Zhu, and J. Chen, Synthesis of Aluminum Nitride Using Sodium Aluminate as Aluminum Source, Processes, 11, No. 4: 1034 (2023); https://doi.org/10.3390/pr11041034
  50. Y. Qiu and L. Gao, Novel Way to Synthesize Nanocrystalline Aluminum Nitride from Coarse Aluminum Powder, J. Am. Ceram. Soc., 86: 1214–1216 (2004); https://doi.org/10.1111/j.1151-2916.2003.tb03452.x
  51. M. Radwan, M. Bahgat, and A.A. El-Geassy, Formation of Aluminium Nitride Whiskers by Direct Nitridation, J. Eur. Ceram. Soc., 26: 2485–2488 (2006); https://doi.org/10.1016/j.jeurceramsoc.2005.06.033
  52. M. Radwan and M. Bahgat, A Modified Direct Nitridation Method for Formation of Nano-AlN Whiskers, J. Mater. Process. Technol., 181: 99–105 (2007); https://doi.org/10.1016/j.jmatprotec.2006.03.045
  53. T. Okada, M. Toriyama, and S. Kanazaki, Synthesis of Aluminium Nitride Sintered Bodies Using the Direct Nitridation of Al Compacts, J. Eur. Ceram. Soc., 20: 783–787 (2000); https://doi.org/10.1016/S0955-2219(99)00204-6
  54. V. Rosenband and A. Gany, Activation of Combustion Synthesis of Aluminium Nitride Powder, J. Mater. Process Technol., 147: 179–203 (2004); http://dx.doi.org/10.1016/j.jmatprotec.2003.12.017
  55. W. Tang, Y. Yu, Y. Yu, Z. Huang, W. Wang, S. Lin, J. Luo, C. Zhang, and Z. Zhang, Low-Temperature Formation of Aluminum Nitride Powder from Amorphous Aluminum Oxalate via Carbothermal Reduction, Inorganics, 13, No. 10: 317 (2025); https://doi.org/10.3390/inorganics13100317
  56. Q. Wen, P. Wang, J.W. Zheng, Y. Ying, J. Yu, W.C. Li, S.L. Che, and L. Qiao, Carbothermal Reduction Synthesis of Aluminum Nitride from Al(OH)3/C/PVB Slurries Prepared by Three-Roll Mixing, Materials, 14: 1386 (2021); https://doi.org/10.3390/ma14061386
  57. S. Chen, K. Lu, X. Zhou, Z. Zhouchen, X. Huang, J. Qi, and T. Lu, High Sphericity AlN Powder Carbothermal Reduced from Spray Granulated Al2O3/C Precursor, Ceram. Int., 51, No. 6: 7336–7342 (2025); https://doi.org/10.1016/j.ceramint.2024.12.170
  58. Z.J. Liu, L.Y. Dai, D.Z. Yang, S. Wang, B.J. Zhang, W.C. Wang, and T.H. Cheng, Synthesis of Aluminum Nitride Powders from a Plasma-Assisted Ball Milled Precursor Through Carbothermal Reaction, Mater. Res. Bull., 61: 152–158 (2015); https://doi.org/10.1016/j.materresbull.2014.10.015
  59. A.L. Molisani and H.N. Yoshimura, Low-temperature Synthesis of AlN Powder with Multicomponent Additive Systems by Carbothermal Reduction–Nitridation Method, Mater. Res. Bull., 45: 733–738 (2010); https://doi.org/10.1016/j.materresbull.2010.02.012
  60. S.M. Lee, M.T. Ayman, S.M. Jang, S. Park, and D.H. Yoon, Synthesis of Pure Fine AlN Powder via CRN Using Nitridation Promoter, Mater. Today Commun., 41: 110935 (2024); https://doi.org/10.1016/j.mtcomm.2024.110935
  61. A. Hermawan, H. Son, Y. Asakura, T. Mori, and S. Yin, Synthesis of Morphology Controllable Aluminum Nitride by Direct Nitridation of γ-AlOOH in the Presence of N2H4 and Their Sintering Behavior, J. Asian Ceram. Soc., 6: 63–69 (2018); https://doi.org/10.1080/21870764.2018.1439611
  62. S.M. Lin, Y.L. Yu, M.F. Zhong, H. Yang, and Y.C. Qiu, The Activation Mechanism of Oxalic Acid on γ-Alumina and the Formation of α-Alumina, Ceram. Int., 47: 26869–26876 (2021); https://doi.org/10.1016/j.ceramint.2021.06.096
  63. R.S. Zhou and R.L. Snyder, Structures and Transformation Mechanisms of the η, γ and θ-Transition Aluminas, Acta Cryst. B, 47: 617–630 (1991); https://doi.org/10.1107/S0108768191002719
  64. Y. Dai, X.M. Min, C.W. Nan, X.M. Pei, and H.L. Ren, Structural Characterization of AION by27 Al Mas NMR and Quantum Chemistry Method, MRS Online Proceedings Library, 538: 573–578 (2011); https://doi.org/10.1557/PROC-538-573
  65. B. Ahmed and B. I. Sharma, Structural and Electronic Properties of AlN in Rocksalt, Zinc Blende and Wurtzite Phase: A dft Study, Digest J. Nanomater. Biostruct., 16, No. 1: 125–133 (2021); https://doi.org/10.15251/DJNB.2021.161.125
  66. W. Werdecker and F. Aldinger, Aluminum Nitride-An Alternative Ceramic Substrate for High Power Applications in Microcircuits, IEEE Transactions on Components, Hybrids, and Manufacturing Technology, 7: 399–404 (1984); https://doi.org/10.1109/TCHMT.1984.1136380
  67. N.A.K. Jadoon, V. Puvanenthiram, M.A.H. Mosa, A. Sharma, and K. Wang, Recent Advances in Aluminum Nitride (AlN) Growth by Magnetron Sputtering Techniques and Its Applications, Inorganics, 12, No. 10: 264 (2024); https://doi.org/10.3390/inorganics12100264
  68. J. Zagorac, D. Zagorac, M. Rosić, J.C. Schön, and B. Matović, Structure Prediction of Aluminum Nitride Combining Data Mining and Quantum Mechanics, CrystEngComm, 19: 5259–5268 (2017); https://doi.org/10.1039/C7CE01039G
  69. Z. Liu, W. Li, Z. Qin, L. Jin, Z. Sun, and H. Wu, Research on the Stability of Different Polar Surfaces in Aluminum Nitride Single Crystals, Crystals, 14, No. 4: 337 (2024); https://doi.org/10.3390/cryst14040337
  70. L. Wang, J. Cheng, K. Qu, Q. Zhu, B. Tian, and Z. Yang, Aluminum-Nitride-Based Semiconductors: Growth Processes, Ferroelectric Properties, and Performance Enhancements, Inorganics 13, No. 2: 29 (2025); https://doi.org/10.3390/inorganics13020029
  71. R. Li, C. Cheng, F. Dong, G. Wu, W. Shen, K. Liang, S. Wang, and S. Liu, A Study on the Mechanical Properties of Polycrystalline Aluminum Nitride Based on Molecular Dynamics Simulation, Mater. Today Nano, 29: 100581 (2025); https://doi.org/10.1016/j.mtnano.2025.100581
  72. C.L. Cunha, T.C. Pimenta, and M.A. Fraga, Development and Applications of Aluminum Nitride Thin Film Technology, in Thin Film Deposition-Fundamentals, Processes, and Applications (IntechOpen: 2022); https://doi.org/10.5772/intechopen.106288
  73. N. Afshar, M. Yassine, and O. Ambacher, A Comprehensive Review of Yttrium Aluminum Nitride: Crystal Structure, Growth Techniques, Properties, and Applications, Sec. Semicond. Mater. Devices, 12: 1526968 (2025); https://doi.org/10.3389/fmats.2025.1526968
  74. S. Saib and N. Bouarissa, Electronic Properties and Elastic Constants of Wurtzite, Zinc-Blende and Rocksalt AlN, J. Phys. Chem. Solids, 67, No. 8: 1888–1892 (2006); https://doi.org/10.1016/j.jpcs.2006.05.007
  75. N. Li, S.K. Yadav, J. Wang, X.-Y. Liu, and A. Misra, Growth and Stress-induced Transformation of Zinc Blende AlN Layers in Al-AlN-TiN Multilayers, Sci. Rep., 5: 18554 (2016); https://doi.org/10.1038/srep18554
  76. J. Ruiz-González, G.H. Cocoletzi, and L. Morales de la Garz, Modeling the Electronic Structure and Stability of Three Aluminum Nitride Phases, Revista Mexicana de Física, 67, No. 3: 343–350 (2021); https://doi.org/10.31349/revmexfis.67.343
  77. V.M. Uvarov, Yu.V. Kudryavtsev, E.M. Rudenko, M.V. Uvarov, and S.A. Bespalov, Phase Composition and Electronic Structure of Aluminium Nitride AlN, Metallofiz. Noveishie Tekhnol., 47, No. 2: 125–134 (2025); https://doi.org/10.15407/mfint.47.02.0125
  78. S. Uehara, T. Masamoto, A. Onodera, M. Ueno, O. Shimomura, and K. Takemura, Equation of State of the Rocksalt Phase of III–V Nitrides to 72 GPa or Higher, J. Phys. Chem. Solids, 58, No. 12: 2093–2099 (1997); https://doi.org/10.1016/S0022-3697(97)00150-9
  79. I. Gorczyca, N. E. Christensen, P. Perlin, I. Grzegory, J. Jun, and M. Bockowski, High Pressure Phase Transition in Aluminium Nitride, Solid State Commun., 79: 1033 (1991); https://doi.org/10.1016/0038-1098(91)90004-F
  80. M. Ueno, A. Onodera, O. Shimomura, and K. Takemura, X-Ray Observation of the Structural Phase Transition of Aluminum Nitride Under High Pressure, Phys. Rev. B, 45, No. 17: 10123–10126 (1992); https://doi.org/10.1103/PhysRevB.45.10123
  81. L. Hultman, S., Benhenda, G. Radnoczi, J.E. Sundgren, J.E. Greene, and I. Petrov, Interfacial Reactions in Single-Crystal-TiN(100)/Al/Polycrystalline-TiN Multilayer Thin Films, Thin Solid Films, 215, No. 2: 152–161 (1992); https://doi.org/10.1016/0040-6090(92)90430-J
  82. A.F. da Silva, N. Souza Dantas, J.S. de Almeida, R. Ahuja, and C. Persson, Electronic and Optical Properties of Wurtzite and Zinc-Blende TlN and AlN, J. Cryst. Growth, 281, No. 1: 151-160 (2005); https://doi.org/10.1016/j.jcrysgro.2005.03.021
  83. P. Tsipas, S. Kassavetis, D. Tsoutsou, E. Xenogiannopoulou, E. Golias, S.A. Giamini, C. Grazianetti, D. Chiappe, A. Molle, M. Fanciulli, A. Dimoulas, Evidence for Graphite-Like Hexagonal AlN Nanosheets Epitaxially Grown on Single Crystal Ag(111), Appl. Phys. Lett., 103, No. 25: (2013); https://doi.org/10.1063/1.4851239
  84. S. Louhibi-Fasla, H. Achour, K. Kefif, and Y. Ghalem, First-Principles Study of High-Pressure Phases of AlN, Phys. Procedia, 55: 324–328 (2014); https://doi.org/10.1016/j.phpro.2014.07.047
  85. C. Bacaksiz, H. Sahin, H.D. Ozaydin, S. Horzum, R.T. Senger, and F.M. Peeters, Hexagonal AlN: Dimensional-Crossover-Driven Band-Gap Transition, Phys. Rev. B, 19, No. 8: 085430 (2015); https://doi.org/10.1103/PhysRevB.91.085430
  86. Q. Peng, X. J. Chen, S. Liu, and S. De, Mechanical Stabilities and Properties of Graphene-Like Aluminum Nitride Predicted from First-Principles Calculations, RSC Adv., 3: 7083–7092 (2013); https://doi.org/10.1039/C3RA40841H
  87. T.T. Yen, T. Hirasawa, P.K. Wright, A.P. Pisano, and L. Lin, Corrugated Aluminum Nitride Energy Harvesters for High Energy Conversion Effectiveness, J. Micromech. Microeng., 21: 085037 (2011); https://doi.org/10.1088/0960-1317/21/8/085037
  88. G. Bu, D. Ciplys, M. Shur, L.J. Schowalter, S. Schujman, and R. Gaska, Surface Acoustic Wave Velocity in Single-Crystal AlN Substrates. IEEE Trans. Ultrason. Ferroelectr. Freq. Control, 53: 251–254 (2006); https://doi.org/10.1109/tuffc.2006.1588412
  89. T.M. Hartnett, S.D. Bernstein, E.A. Maguire, and R.W. Tustison, Optical Properties of ALON (Aluminum Oxynitride), Proc. SPIE, 3060: 284–295 (1997); https://doi.org/10.1117/12.277053
  90. Z. Fan, Z. Qin, Z. Sun, and H. Wu, Broad Spectrum Detector Based on AlN Crystal, J. Phys. Conf. Ser., 2350: 012013 (2022); https://doi.org/10.1088/1742-6596/2350/1/012013
  91. H. Liu, P.-F. Shao, S.-L. Chen, T. Tao, Y. Yan, Z.-L. Xie, B. Liu, D.-J. Chen, H. Lu, R. Zhang, and K. Wang, Pit Density Reduction for AlN Epilayers Grown by Molecular Beam Epitaxy Using Al Modulation Method, Chin. Phys. B, 33: 106801 (2024); https://doi.org/10.1088/1674-1056/ad7671
  92. M.K. Sandager, C. Kjelde, and V. Popok, Growth of Thin AlN Films on Si Wafers by Reactive Magnetron Sputtering: Role of Processing Pressure, Magnetron Power and Nitrogen/Argon Gas Flow Ratio, Crystals, 12, No. 10: 1379 (2022); https://doi.org/10.3390/cryst12101379
  93. K. Bespalova, G. Ross, S. Suihkonen, and M. Paulasto-Kröckel, Metalorganic Chemical Vapor Deposition of AlN on High Degree Roughness Vertical Surfaces for MEMS Fabrication, Adv. Electron. Mater., 10, No. 4: 2300628 (2024); https://doi.org/10.1002/aelm.202300628
  94. M. Muhammed, M. Javidani, T.E. Sadrabadi, M. Heidari, T. Levasseur, and M. Jahazi, A Comprehensive Review of Cathodic Arc Evaporation Physical Vapour Deposition (CAE-PVD) Coatings for Enhanced Tribological Performance, Coatings, 14, No. 3: 246 (2024); https://doi.org/10.3390/coatings14030246
  95. R. Вadis, J. Camus, A. Ayad, M. Rammal, R. Zernadji, N. Rouag, M. Abdou, and D. Hetero, Epitaxial Growth of AlN Deposited by DC Magnetron Sputtering on Si(111) Using a AlN Buffer Layer, Coatings, 11, No. 9: 1063 (2021); https://doi.org/10.3390/coatings11091063
  96. T.H. Kim and G.Y. Yeom, A Review of Inductively Coupled Plasma-Assisted Magnetron Sputter System, Appl. Sci. Converg. Technol., 28: 131–138 (2019); https://doi.org/10.5757/ASCT.2019.28.5.131
  97. R.P. Martinho, F.J.G. Silva, R.J.D. Alexandre, and A.P.M. Baptista, TiB2 Nanostructured Coating for GFRP Injection Moulds, J. Nanosci. Nanotechnol, 11: 5374–5382 (2011); https://doi.org/10.1166/jnn.2011.3772
  98. P. Borowski and J. Myśliwiec, Recent Advances in Magnetron Sputtering: From Fundamentals to Industrial Applications, Coatings, 15, No. 8: 922 (2025); https://doi.org/10.3390/coatings15080922
  99. A. Iqbal, K. Chaik, G. Walker, A. Iacopi, F. Mohd-Yasin, and S. Dimitrijev, RF Sputtering of Polycrystalline (100), (002), and (101) Oriented AlN on an Epitaxial 3C-SIC (100) on Si (100) Substrate. J. Vac. Sci. Technol. B, 32: 06F401 (2014); https://doi.org/10.1116/1.4900418
  100. A. Iqbal and F. Mohd-Yasin, Reactive Sputtering of Aluminum Nitride (002) Thin Films for Piezoelectric Applications: A Review, Sensors, 18: 1797 (2018); https://doi.org/10.3390/s18061797
  101. V. Popov, M. Chirumamilla, T. Krekeler, M. Ritter, and K. Pedersen, Magnetron Sputter Grown AlN Nanostructures with Giant Piezoelectric Response toward Energy Generation, ACS Appl. Nano Mater., 6: 8849-8856 (2023); https://doi.org/10.1021/acsanm.3c01250
  102. L. Behera, N. Pandey, and M. Gupta, Synthesis and Characterization of AlN Thin Films Deposited Using DC and RF Magnetron Sputtering, AIP Conf. Proc., 2265: 030310 (2020); https://doi.org/10.1063/5.0017482
  103. T.A. Edison, Art of plating one material with another, MKI, C23C14/325, Patent US526147A (Published 18.09.1894).
  104. Handbook of Vacuum Arc Science and Technology (Eds. R.L. Boxman, D.M. Sanders, and P.J. Martin) (Park Ridge, NJ: Noyes Publications: 1995).
  105. Handbook of Plasma Immersion Ion Implantation and Deposition (Ed. А. Anders) (John Wiley and Sons, Inc.: 2000).
  106. D.M. Sanders and A. Anders, Review of Cathodic arc Deposition Technology at the Start of the new Millennium, Surf. Coat. Technol., 133–134: 78–90 (2000); https://doi.org/10.1016/S0257-8972(00)00879-3
  107. A.A. Andreev, L.P. Sablev, V.M. Shulaev, and S.N. Grigoriev, Vacuum-Arc Devices and Coatings (Kharkiv: NSC ‘KIPT’: 2005).
  108. B. Druz, Y. Yevtukhov, and I. Zaritskiy, Diamond-Like Carbon Overcoat for TFMH Using Filtered Cathodic Arc System with Ar-Assisted Arc Discharge, Diamond Relat. Mater., 14: 1508–1516 (2005); https://doi.org/10.1016/j.diamond.2005.04.007
  109. Z. Liu, M. Song, Z. Wang, W. Yang, Y. Dong, Q.Sun, and Q. Zhou, Effects of Anode Evaporation Process on the Anode Sheath Characteristics in Vacuum Arc Plasma, J. Phys. D: Appl. Phys., 58: 115201 (2025); https://doi.org/10.1088/1361-6463/ad7c5c
  110. A. Anders, Ion Charge State Distribution of Vacuum Arc Plasmas: The Origin of Species, Phys. Rev. E, 55, No. 1: 969–981 (1997); https://doi.org/10.1103/PhysRevE.55.969
  111. E. Byon and A. Anders, Ion Energy Distribution Functions of Vacuum Arc Plasmas, J. Appl. Phys., 93, No. 4: 1899–1906 (2003); https://doi.org/10.1063/1.1539535
  112. I.I. Beilis, The Phenomenon of a Cathode Spot in an Electrical Arc: The Current Understanding of the Mechanism of Cathode Heating and Plasma Generation, Plasma, 7, No. 2: 329–354 (2024); https://doi.org/10.3390/plasma7020019
  113. R.L. Boxman and S. Goldsmith, Macroparticle Contamination in Cathodic Arc Coatings: Generation, Transport and Control, Surf. Coat. Technol., 52: 39–50 (1992); https://doi.org/10.1016/0257-8972(92)90369-L
  114. Handbook of Vacuum Arc Science and Technology. Fundamentals and Applications (Eds. R.L. Boxman, D.M. Sanders, and P.J. Martin) (Park Ridge, NJ: Noyes Publications: 1996).
  115. A. Anders, A Review Comparing Cathodic Arcs and High Power Impulse Magnetron Sputtering (HiPIMS), Surf. Coat. Technol., 257: 308–325 (2014); http://doi.org/10.1016/j.surfcoat.2014.08.043
  116. R. Vladoiu, M. Tichý, A. Mandes, V. Dinca, and P. Kudrna, Thermionic Vacuum Arc—A Versatile Technology for Thin Film Deposition and Its Applications, Coatings, 10, No. 3: 211 (2020); https://doi.org/10.3390/coatings10030211
  117. A. Shpak, E. Rudenko, I. Korotash, V. Semenyuk, V. Odinokov, G. Pavlov, and V. Sologub, Plasma Source of Low-Temperature Formation of Metal-Catalyst Nanoclusters, Nanoindustriya (Nanoindustry), 4: 12–15 (2009).
  118. L. Osipov, E. Rudenko, V. Semenyuk, I. Korotash, V. Odinokov, G. Pavlov, and V. Sologub, Highly Effective Source of Low Temperature Deposition of Films and Coatings, Nanoindustriya (Nanoindustry), 2: 4–7 (2010).
  119. I. Korotash, V. Odinokov, G. Pavlov, E. Rudenko, D. Polotsky, V. Semenyuk, and V. Sologub, A Plant for Nanostructures Formation, Nanoindustriya (Nanoindustry), 4: 14–19 (2010).
  120. I. Korotash, V. Odinokov, G. Pavlov, D. Polotsky, E. Rudenko, V. Semenyuk, and V. Sologub, Formation of Carbon Nanostructures in a Single Technological Cycle, Nanoindustriya (Nanoindustry), 1: 10–14 (2011).
  121. V.F. Semenyuk, E.M. Rudenko, I.V. Korotash, L.S. Osipov, D.Yu. Polotskiy, K.P. Shamray, V.V. Odinokov, G.Ya. Pavlov, and V.A. Sologub, Unitized Ion-Plasma Processing Equipment for Fabrication of Nanostructures, Metallofiz. Noveishie Tekhnol., 33, No. 2: 223–231 (2011).
  122. V.F. Semenyuk, V.F. Virko, I.V. Korotash, L.S. Osipov, D.Yu. Polotsky, E.M. Rudenko, V.M. Slobodyan, and K.P. Shamrai, Сontrolling Parameters Determining Technological Properties of a Helicon Discharge System, Problems Atomic Sci. Technol., 4, No. 86: 179–182 (2013).
  123. E.M. Rudenko, I.V. Korotash, V.F. Semenjuk, and K.P. Shamraj, Plant for Precision Ionic-Plasma Formation of Carbon Nanotubes in the United Vacuum-Technological Cycle, Nauka Innov., 5, No. 5: 5–8 (2009); https://doi.org/10.15407/scin5.05.005
  124. E.M. Rudenko, I.V. Korotash, V.F. Semenjuk, and K.P. Shamraj, Vacuum-Plasma Module for the Forming of Structure Element Base of Nanoelectronics and Microenergetics, Nauka Innov., 6, No. 3: 36–38 (2010); https://doi.org/10.15407/scin6.03.036
  125. E.M. Rudenko, V.Ye. Panarin, P.O. Kyrychok, M.Ye. Svavilnyi, I.V. Korotash, O.O. Palyukh, D.Yu. Polotskyi, and R.L. Trishchuk, Nitriding in a Helicon Discharge as a Promising Technique for Changing the Surface Properties of Steel Parts, Prog. Phys. Met., 20, No. 3: 485–501 (2019); https://doi.org/10.15407/ufm.20.03.485